RIE System

  • Dry Etching System designed for Advanced LSI with Fine Process. It has superior functions and Ease of Use as system is specialized for LSI Failure Analysis that has the capability for high aspect ratio etching on multi-layered devices. Memory function to store variable etching conditions.
  • Memory Function for Recipes & W-Step program Function
  • Saving the Etching condition, Easy Maintenance
  • Record of Operation History
  • Stage Temperature Control by Peltier Device
  • VCR Joint for Process Gas Pipe
  • Dry Pump is also available